Optical semiconductor device and method for manufacturing same

ABSTRACT

According to one embodiment, an optical semiconductor device includes a light emitting layer, a transparent layer, a first metal post, a second metal post and a sealing layer. The light emitting layer includes a first and a second major surface, a first and a second electrode. The second major surface is a surface opposite to the first major surface, and the first electrode and second electrodes are formed on the second major surface. The transparent layer is provided on the first major surface. The first metal post is provided on the first electrode. The second metal post is provided on the second electrode. The sealing layer is provided on the second major surface. The sealing layer covers a side surface of the light emitting layer and seals the first and second metal posts while leaving end portions of the first and second metal posts exposed.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. application Ser. No.13/154,999, filed Jun. 7, 2011, which is based upon and claims thebenefit of priority from the prior Japanese Patent Application No.2010-130526, filed on Jun. 7, 2010, the entire contents of which areincorporated herein by reference.

FIELD

Embodiments described herein relate generally to an opticalsemiconductor device and a method for manufacturing the same.

BACKGROUND

Various semiconductor light emitting elements that emit not only in thevisible light band of red, green, blue, etc., but also in the widewavelength band from infrared light to ultraviolet light are beingutilized as small and low power-consumption light emitting elements.Optical semiconductor devices also have been developed to emit whitelight by a combination of a fluorescer and a semiconductor lightemitting element such as, for example, a blue LED (Light EmittingDiode).

The most versatile optical semiconductor device currently used as aproduct is a semiconductor light emitting element in which asemiconductor layer is epitaxially grown on a substrate. In other words,the individual semiconductor light emitting elements are obtained byepitaxially growing the semiconductor layer on a substrate such as GaAs,GaP, sapphire, etc., forming electrodes and the like, and subsequentlysubdividing. Then, the optical semiconductor devices are completed bymounting the semiconductor light emitting elements thus obtained ontoleadframes, SMD (Surface Mounting Device)-type housings, variousmounting substrates, etc., performing the prescribed interconnects, andsealing the semiconductor light emitting elements with a transparentresin.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a cross-sectional view illustrating the schematicconfiguration of an optical semiconductor device according to theembodiment, FIG. 1B is a plan view illustrating a lower surface of theoptical semiconductor device illustrated in FIG. 1A;

FIGS. 2A and 2B are schematic views illustrating a second specificexample of the first embodiment;

FIGS. 3A and 3B are schematic views illustrating a third specificexample of the first embodiment;

FIGS. 4A and 4B are schematic views illustrating a fourth specificexample of the first embodiment;

FIGS. 5A and 5B are schematic views illustrating a fifth specificexample of the first embodiment;

FIG. 6 is a cross-sectional view illustrating the schematicconfiguration of an optical semiconductor device according to a secondembodiment and is a cross-sectional view corresponding to FIG. 1A;

FIG. 7 is a cross-sectional view illustrating the schematicconfiguration of an optical semiconductor device according to a thirdembodiment;

FIG. 8 is a cross-sectional view illustrating the schematicconfiguration of an optical semiconductor device according to a fourthembodiment;

FIGS. 9A to 9D are cross-sectional views illustrating the schematicconfiguration of optical semiconductor devices according to a fifthembodiment;

FIGS. 10A to 10D are cross-sectional views illustrating the schematicconfiguration of optical semiconductor devices according to a sixthembodiment;

FIG. 11 is a cross-sectional view illustrating the schematicconfiguration of an optical semiconductor device according to a seventhembodiment;

FIG. 12A is a cross-sectional view illustrating the schematicconfiguration of an optical semiconductor device according to an eighthembodiment, FIG. 12B is a plan view illustrating the lower surface ofthe optical semiconductor device illustrated in FIG. 12A;

FIGS. 13A to 13D are cross-sectional views of processes, illustrating amethod for manufacturing an optical semiconductor device of a ninthembodiment;

FIGS. 14A to 14D are cross-sectional views of processes, illustrating amethod for manufacturing an optical semiconductor device of a ninthembodiment;

FIGS. 15A to 15D are cross-sectional views of processes, illustrating amethod for manufacturing an optical semiconductor device of a ninthembodiment;

FIGS. 16A to 16C are cross-sectional views of processes, illustrating aportion of a method for manufacturing an optical semiconductor device ofa tenth embodiment;

FIGS. 17A to 17C are cross-sectional views of processes, illustrating aportion of a method for manufacturing an optical semiconductor device ofan eleventh embodiment;

FIGS. 18A to 18D are cross-sectional views of processes, illustrating aportion of a method for manufacturing an optical semiconductor device ofa twelfth embodiment;

FIGS. 19A to 19D are cross-sectional views of processes, illustrating aportion of a method for manufacturing an optical semiconductor device ofa thirteenth embodiment; and

FIGS. 20A to 20D are cross-sectional views of processes, illustrating aportion of a method for manufacturing an optical semiconductor device ofa fourteenth embodiment.

DETAILED DESCRIPTION

In general, according to one embodiment, an optical semiconductor deviceincludes a light emitting layer, a transparent layer, a first metalpost, a second metal post and a sealing layer. The light emitting layerincludes a first major surface, a second major surface, a firstelectrode, and a second electrode. The second major surface is a surfaceopposite to the first major surface, and the first electrode and thesecond electrode are formed on the second major surface. The transparentlayer is provided on the first major surface, and the transparent layeris transparent. The first metal post is provided on the first electrode.The second metal post is provided on the second electrode. The sealinglayer is provided on the second major surface. The sealing layer isconfigured to cover a side surface of the light emitting layer and sealthe first metal post and the second metal post while leaving an endportion of the first metal post and an end portion of the second metalpost exposed.

In general, according to another embodiment, an optical semiconductordevice includes a light emitting layer, a fluorescent layer, a firstmetal post, a second metal post, and a sealing layer. The light emittinglayer includes a first major surface, a second major surface, a firstelectrode, and a second electrode. The second major surface is a surfaceopposite to the first major surface. The first electrode and the secondelectrode are formed on the second major surface. The fluorescent layeris provided on the first major surface. The fluorescent layer includes afluorescer configured to absorb light emitted from the light emittinglayer and emit light of a different wavelength. The first metal post isprovided on the first electrode. The second metal post is provided onthe second electrode. The sealing layer is provided on the second majorsurface. The sealing layer is configured to cover a side surface of thelight emitting layer and seal the first metal post and the second metalpost while leaving an end portion of the first metal post and an endportion of the second metal post exposed.

In general, according to one embodiment, an optical semiconductor deviceincludes a light emitting layer, a fluorescent layer, a first metalpost, a second metal post and a sealing layer. The light emitting layerincludes a first major surface, a second major surface, a firstelectrode, and a second electrode. The second major surface is a surfaceopposite to the first major surface, and the first electrode and thesecond electrode are formed on the second major surface. The fluorescentlayer is provided on the first major surface, and the fluorescent layerincludes a fluorescer configured to absorb light emitted from the lightemitting layer and emit light of a different wavelength. The first metalpost is provided on the first electrode. The second metal post isprovided on the second electrode. The sealing layer is provided on thesecond major surface, and the sealing layer is configured to cover aside surface of the light emitting layer and seal the first metal postand the second metal post while leaving an end portion of the firstmetal post and an end portion of the second metal post exposed.

In general, according to one embodiment, a method is disclosed formanufacturing an optical semiconductor device. The method can includeforming a light emitting layer by forming a plurality of sets of apositive electrode and a negative electrode on a first major surfaceside of a semiconductor stacked body including a plurality ofsemiconductor layers. The semiconductor stacked body is separated from asubstrate after being epitaxially grown on the substrate. The method caninclude forming a transparent layer on a second major surface side ofthe light emitting layer opposite to the first major surface. Thetransparent layer is transparent to light emitted from the lightemitting layer. In addition, the method can include performingsingulation for each of the sets of the positive electrode and thenegative electrode.

Various embodiments will be hereinafter described with reference to theaccompanying drawings.

The drawings are schematic or conceptual; and the relationships betweenthe thicknesses and widths of portions, the proportions of sizes amongportions, etc., are not necessarily the same as the actual valuesthereof. Further, the dimensions and the proportions may be illustrateddifferently among the drawings, even for identical portions.

In the specification and the drawings of the application, componentssimilar to those described in regard to a drawing thereinabove aremarked with like reference numerals, and a detailed description isomitted as appropriate.

First Embodiment

A first embodiment will now be described with reference to FIGS. 1A and1B.

FIG. 1A is a cross-sectional view illustrating the schematicconfiguration of an optical semiconductor device according to theembodiment. FIG. 1B is a plan view illustrating a lower surface of theoptical semiconductor device illustrated in FIG. 1A.

The optical semiconductor device 1A according to the embodiment asillustrated in FIGS. 1A and 1B includes a light emitting layer 2 havinga first major surface M1 and a second major surface M2, a bonding layer3 provided on the first major surface M1, a transparent layer 5 providedon the bonding layer 3, a reflective layer 6 provided in a first regionof the second major surface M2 of the light emitting layer 2, a firstelectrode 7 a provided in a second region of the second major surfaceM2, multiple second electrodes 7 b provided on the reflective layer 6, afirst metal post 8 a provided on the first electrode 7 a, multiplesecond metal posts 8 b provided on the second electrodes 7 b, aninsulating layer 9 provided on the second major surface M2 of the lightemitting layer 2 while avoiding each of the metal posts 8 a and 8 b, asealing layer 10 provided on the insulating layer 9 to seal each of themetal posts 8 a and 8 b, a first metal layer 11 a provided on the endportion of the first metal post 8 a, and multiple second metal layers 11b provided on the end portions of the second metal posts 8 b.

The light emitting layer 2 includes a semiconductor stacked bodyincluding a first semiconductor layer 2 a, a second semiconductor layer2 b having a surface area less than that of the first semiconductorlayer 2 a, and an active layer 2 c clamped between the firstsemiconductor layer 2 a and the second semiconductor layer 2 b. Thefirst semiconductor layer 2 a is, for example, a first cladding layerwhich is an n-type semiconductor layer. The second semiconductor layer 2b is, for example, a second cladding layer which is a p-typesemiconductor layer. However, the conductivity types of these layers arearbitrary. That is, the first semiconductor layer 2 a may be the p typeand the second semiconductor layer 2 b may be the n type.

The first semiconductor layer 2 a, the second semiconductor layer 2 b,and the active layer 2 c may include various compound semiconductorssuch as an InGaAlAs-based compound semiconductor, an InGaAlP-basedcompound semiconductor, and an InGaAlN-based compound semiconductor,etc.

For example, infrared light or a red light emission can be obtained byusing GaAlAs as the material of the active layer 2 c. A light emissionof orange, yellow, green, etc., can be obtained by using InGaAlP as thematerial of the active layer 2 c. A green or blue light emission orultraviolet light can be obtained by using an InGaAlN-based compoundsemiconductor as the material of the active layer 2 c.

Each of the first semiconductor layer 2 a, the second semiconductorlayer 2 b, and the active layer 2 c is not limited to being a singlelayer. For example, the active layer 2 c may have a multilayeredstructure in which a quantum well layer and a barrier layer arecombined. Similarly, the first semiconductor layer 2 a and the secondsemiconductor layer 2 b also may have multilayered structures in whichmultiple semiconductor layers are combined.

In the case where an InGaAlN-based compound semiconductor is used, thefirst semiconductor layer 2 a is, for example, an n-type cladding layerincluding GaN. The second semiconductor layer 2 b is, for example, ap-type cladding layer including GaN. The active layer 2 c includes, forexample, a quantum well layer made of InGaN and a barrier layer made ofAlGaN stacked with the quantum well layer. Thus, the active layer 2 cmay have, for example, a single quantum well structure or a multiplequantum well structure.

The light emitting layer 2 is formed by, for example, sequentiallydepositing a crystal used to form the first semiconductor layer 2 a, acrystal used to form the active layer 2 c, and a crystal used to formthe second semiconductor layer 2 b on a not-illustrated substrate suchas GaAs, GaP, sapphire, etc., and by subsequently removing the activelayer 2 c and the second semiconductor layer 2 b in a prescribed region.The not-illustrated substrate also is removed from the light emittinglayer 2. The thickness of the light emitting layer 2 is, for example,about 5 micrometers.

The first major surface M1 is the upper surface (in FIGS. 1A and 1B) ofthe first semiconductor layer 2 a. The second major surface M2 is thelower surface (in FIGS. 1A and 1B) of the first semiconductor layer 2 aand the lower surface (in FIGS. 1A and 1B) of the second semiconductorlayer 2 b; and there is a difference in levels therebetween. That is,the semiconductor stacked body, which includes the first semiconductorlayer 2 a, the second semiconductor layer 2 b, and the active layer 2 c,has the first major surface M1 and the second major surface M2 on theside opposite to the first major surface M1. The first electrode 7 a andthe second electrode 7 b are provided on the second major surface M2side of the semiconductor stacked body.

As illustrated in FIG. 1B, the planar configuration of the firstsemiconductor layer 2 a is, for example, a square having sides of 550micrometers (referring to the dotted line of FIG. 1B). The secondsemiconductor layer 2 b is formed on the lower surface (in FIGS. 1A and1B) of the first semiconductor layer 2 a in a region excluding a cornerregion (a square having sides of 150 micrometers) of the firstsemiconductor layer 2 a with the active layer 2 c interposed. The activelayer 2 c has the same configuration as the second semiconductor layer 2b and has about the same surface area.

The bonding layer 3 is formed of, for example, a silicone resin. Thethickness of the bonding layer 3 is, for example, not more than 1micrometer. The bonding layer 3 bonds the first major surface M1 of thefirst semiconductor layer 2 a of the light emitting layer 2 to thetransparent layer 5. The silicone resin is, for example, methyl phenylsilicone having a refractive index of about 1.5. Other than methylphenyl silicone, the resin included in the bonding layer 3 may be asilicone resin having another composition such as dimethyl silicone. Thesilicone resin is advantageous in the case where the emitted light fromthe light emitting layer 2 has a wavelength of blue or ultravioletbecause the silicone resin has a high durability to blue andultraviolet.

On the other hand, a resin appropriate for the application such as anepoxy resin, a hybrid resin of an epoxy resin and a silicone resin, aurethane resin, etc., may be used as the material of the bonding layer 3in the case where the luminance of the light emitted from the lightemitting layer 2 is low or degradation due to blue light does not occur.

The transparent layer 5 is transparent to the light emitted from thelight emitting layer 2. The transparent layer 5 may be formed of aninorganic material or an organic material. Inorganic materials, forexample, may include various oxides such as glass, quartz, aluminumoxide, etc., various nitrides such as silicon nitride, etc., variousfluorides such as magnesium fluoride, etc. Organic materials mayinclude, for example, acryl, epoxy, polycarbonate, polypropylene,polyethylene, silicone resin, etc.

The thickness of the transparent layer 5 may be, for example, about 200micrometers. The material of the transparent layer 5 is not limited to atransparent material; and it is sufficient to transmit the light emittedfrom the light emitting layer 2. In other words, it is sufficient forthe material of the transparent layer 5 not to completely absorb orreflect the light emitted from the light emitting layer 2. By providingthe transparent layer 5, the light extraction efficiency can beincreased because the difference between the refractive index of thefirst semiconductor layer 2 a and the refractive index of air can bereduced. In other words, the total internal reflection of the lightemitted from the light emitting layer 2 at the light extraction surfaceof the light emitting layer 2 can be suppressed by providing thetransparent layer 5 with a refractive index between the refractive indexof the first semiconductor layer 2 a and the refractive index of air. Asa result, the extraction efficiency of the light emitted from the lightemitting layer 2 to the outside (into the air) can be increased.

From this aspect, it is desirable for the transparent layer 5 to beformed of a transparent material having a refractive index in the rangeof 1 to 2.

As described below in detail using specific examples, the transparentlayer 5 may have an effect of changing the propagation direction of thelight such as, for example, a lens effect and/or a refraction effect.Thereby, the irradiation angle of the light emitted from the lightemitting layer 2 can be adjusted.

The reflective layer 6 is formed of a metal such as Ag, Al, etc. Thethickness of the reflective layer 6 is, for example, 0.3 micrometers.The reflective layer 6 is provided in the entire region (the firstregion) of the lower surface (in FIGS. 1A and 1B) of the secondsemiconductor layer 2 b of the light emitting layer 2. In particular, acontact electrode (not illustrated) of Ni/Au is formed of metals such asNi/Au having thicknesses of 0.1 micrometers/0.1 micrometers on the lowersurface of the second semiconductor layer 2 b; and the reflective layer6 is formed thereon with a thickness of 0.3 micrometers.

The first electrode 7 a is formed of, for example, metals such as Ni/Auhaving thicknesses of 0.1 micrometers/0.1 micrometers. The thickness ofthe first electrode 7 a is, for example, 0.2 micrometers. The firstelectrode 7 a is provided, for example, in a circular configurationhaving a diameter of 100 micrometers on an exposed region (the secondregion) of the lower surface (FIG. 1A) of the first semiconductor layer2 a of the light emitting layer 2 (referring to FIG. 1B).

Each of the second electrodes 7 b also is formed of, for example, metalssuch as Ni/Au having thicknesses of 0.1 micrometers/0.1 micrometers. Thethickness of each of the second electrodes 7 b is, for example, 0.2micrometers. The second electrodes 7 b are provided in, for example,circular configurations having diameters of 100 micrometers on the lowersurface (FIG. 1A) of the reflective layer 6 at a pitch of 200micrometers (referring to FIG. 1B).

The first metal post 8 a is formed of, for example, a metal such as Cuin a circular columnar configuration. The height of the first metal post8 a is about, for example, 100 micrometers; and the diameter thereof is,for example, 100 micrometers. The first metal post 8 a is configured toconduct current to the first electrode 7 a. The configurations of thefirst electrode 7 a and the first metal post 8 a are modifiable asappropriate.

Each of the second metal posts 8 b is formed of, for example, a metalsuch as Cu in a circular columnar configuration. The height of thesecond metal post 8 b is, for example, 100 micrometers; and the diameterthereof is, for example, 100 micrometers. The second metal post 8 b isconfigured to conduct current to the second electrode 7 b. Similarly tothe disposition of the second electrodes 7 b, the second metal posts 8 bare provided at a pitch of, for example, 200 micrometers (referring toFIGS. 2A and 2B). The configurations of the second electrode 7 b and thesecond metal post 8 b also are modifiable as appropriate.

The insulating layer 9 is formed of, for example, an insulating materialsuch as SiO₂ and functions as a passivation film (a protective film).The thickness of the insulating layer 9 is, for example, 0.3micrometers. The insulating layer 9 completely covers the light emittinglayer 2 to the end portions thereof and prevents the flow of current tothe outside except for through the first electrode 7 a and the secondelectrodes 7 b. Thereby, shorts, etc., due to the mounting soldercreeping up can be prevented.

The sealing layer 10 is formed of, for example, a thermosetting resin.Similarly to each of the metal posts 8 a and 8 b, the thickness of thesealing layer 10 is about 100 micrometers. The sealing layer 10 isprovided on the entire surface of the insulating layer 9 to seal thefirst metal post 8 a and each of the second metal posts 8 b whileleaving the end portion of the first metal post 8 a and the end portionof each of the second metal posts 8 b exposed. Thereby, the perimetersurfaces of the first metal post 8 a and each of the second metal posts8 b are completely covered with the sealing layer 10.

The sealing layer 10 also covers the side surface of the light emittinglayer 2. In other words, as illustrated in FIG. 1A, the side surface ofthe light emitting layer 2 between the first major surface M1 and thesecond major surface M2 is covered with the sealing layer 10 with theinsulating layer 9 interposed. This configuration may be used not onlyin the embodiment but similarly in all of the embodiments describedbelow in regard to FIG. 2A to FIG. 20D. In the case where the sealinglayer 10 is formed of a material that is light-shielding with respect tothe light emitted from the light emitting layer 2, the leakage of thelight from the side surface of the light emitting layer 2 can beprevented by the side surface of the light emitting layer 2 beingcovered with the sealing layer 10.

Although the insulating layer 9 is provided to completely cover thelight emitting layer 2 to the end portions thereof, the embodiment isnot limited thereto. For example, the sealing layer 10 may be providedover the insulating layer 9 to completely cover the light emitting layer2 to the end portions thereof. In such a case as well, shorts, etc., dueto the mounting solder creeping up can be prevented because the flow ofcurrent to the outside except for through the first electrode 7 a andeach of the second electrodes 7 b is prevented.

The first metal layer 11 a and each of the second metal layers 11 b areformed of, for example, metals such as Ni/Au having thicknesses of 1.0micrometers/0.1 micrometers. The first metal layer 11 a is provided onthe end portion, i.e., the exposed portion, of the first metal post 8 a.The second metal layers 11 b are provided on the end portions, i.e., theexposed portions, of the second metal posts 8 b, respectively. The firstmetal layer 11 a has the same circular configuration as the firstelectrode 7 a; and the second metal layer 11 b has the same circularconfiguration as the second electrode 7 b (referring to FIG. 1B).

When a voltage is applied to the first metal post 8 a and each of thesecond metal posts 8 b in such an optical semiconductor device 1A, apotential is applied from the first metal post 8 a to the firstsemiconductor layer 2 a; a potential is applied from each of the secondmetal posts 8 b to the second semiconductor layer 2 b; and light isradiated from the active layer 2 c interposed between the firstsemiconductor layer 2 a and the second semiconductor layer 2 b. Aportion of the radiated light passes through the transparent layer 5 andis emitted as-is from the front surface of the transparent layer 5; andanother portion is reflected by the reflective layer 6, passes throughthe transparent layer 5, and is emitted from the front surface of thetransparent layer 5.

According to the structure of the embodiment, the device configurationis simplified; and a small optical semiconductor device 1A having thesame size as the planar surface area of the light emitting layer 2 canbe obtained. Further, costs can be suppressed because it is unnecessaryto perform the molding and mounting processes, the connection process,etc., when manufacturing, and manufacturing is possible using normalsemiconductor manufacturing apparatuses.

By forming the transparent layer 5 on the light emitting layer 2, thelight extraction efficiency can be increased because it is possible toreduce the refractive index difference between the light emitting layer2 and the air. According to the structure of the embodiment, thedifference of the linear coefficient of thermal expansion between aglass epoxy substrate, which is a general wiring substrate, and thelight emitting layer 2 can be reduced by the metal posts 8 a and 8 beven in the case where an optical semiconductor device 1A having thesame planar surface area as the light emitting layer 2 is mounted to theglass epoxy substrate. As a result, the reliability when mounting theoptical semiconductor device 1A can be ensured.

According to the first embodiment of the invention as described above,the optical semiconductor device 1A of the structure described above isobtained by providing a transparent inorganic substance or organicsubstance on the light emitting layer 2 as the transparent layer 5,providing the first metal post 8 a on the first electrode 7 a of thelight emitting layer 2, providing the second metal post 8 b on each ofthe second electrodes 7 b of the light emitting layer 2, and providingthe sealing layer 10 on the light emitting layer 2 to seal the firstmetal post 8 a and the second metal posts 8 b.

According to the optical semiconductor device 1A, a shortening of thelife can be deterred in the case where the transparent layer 5 is formedof an inorganic substance, a silicone resin, etc., because thedegradation of the transparent layer 5 due to the light (in particular,the blue light) radiated from the light emitting layer 2 is prevented.Also, cost reductions can be realized because manufacturing costs arereduced by simplifying the device configuration. Additionally, theoptical semiconductor device 1A can be downsized to about the same sizeas that of a normal optical semiconductor element because the planarsize of the device can be about the same as the planar surface area ofthe light emitting layer 2 by simplifying the device configuration.

According to the embodiment, it is also possible to provide thetransparent layer 5 with an optical function.

FIGS. 2A and 2B are schematic views illustrating a second specificexample of the embodiment. Namely, FIG. 2A is a cross-sectional view ofan optical semiconductor device of this specific example; and FIG. 2B isa plan view thereof as viewed from the Z direction. FIG. 2A illustratesa cross section along line A-A of FIG. 2B.

In the specific example, a lens 5 a is formed in a protrudingconfiguration on the light extraction surface of the transparent layer5. Thereby, a light concentration effect of the light emitted from thelight emitting layer 2 is obtained.

FIGS. 3A and 3B are schematic views illustrating a third specificexample of the embodiment. Namely, FIG. 3A is a cross-sectional view ofan optical semiconductor device of the specific example; and FIG. 3B isa plan view thereof as viewed from the Z direction. FIG. 3A illustratesthe cross section along line A-A of FIG. 3B.

In the specific example, a lens 5 b is formed in a concave configurationon the light extraction surface of the transparent layer 5. Thus, it isalso possible to spread the light emitted from the light emitting layer2 to control the light distribution characteristics.

FIGS. 4A and 4B are schematic views illustrating a fourth specificexample of the embodiment. Namely, FIG. 4A is a cross-sectional view ofan optical semiconductor device of the specific example; and FIG. 4B isa plan view thereof as viewed from the Z direction. FIG. 4A illustratesthe cross section along line A-A of FIG. 4B.

In the specific example, multiple lenses 5 a are formed in protrudingconfigurations on the light extraction surface of the transparent layer5. Thus, it is also possible to emit the light emitted from the lightemitting layer 2 as multiple converging light beams.

FIGS. 5A and 5B are schematic views illustrating a fifth specificexample of the embodiment. Namely, FIG. 5A is a cross-sectional view ofan optical semiconductor device of the specific example; and FIG. 5B isa plan view thereof as viewed from the Z direction. FIG. 5A illustratesthe cross section along line A-A of FIG. 5B.

In the specific example, a Fresnel lens 5 c is formed on the lightextraction surface of the transparent layer 5. By forming the Fresnellens 5 c, it is possible to control the light distributioncharacteristics by concentrating the light emitted from the lightemitting layer 2 while using a thin transparent layer 5.

According to the embodiment, the transparent layer 5 is bonded to thelight emitting layer 2 by the bonding layer 3. That is, it is easy toform the transparent layer 5 beforehand as a separate member.Accordingly, it is possible to manufacture with low costs an opticalsemiconductor device including the transparent layer 5 having variouslens configurations such as those described above in regard to FIG. 2Ato FIG. 5B or other configurations to obtain other various lightdistribution characteristics.

Second Embodiment

A second embodiment of the invention will now be described withreference to FIG. 6. Mainly, portions of the embodiment different fromthose of the first embodiment will be described. Portions of theembodiment similar to portions described in regard to the firstembodiment are marked with like reference numerals, and a descriptionthereof is omitted as appropriate.

FIG. 6 is a cross-sectional view illustrating the schematicconfiguration of the optical semiconductor device according to theembodiment and is a cross-sectional view corresponding to FIG. 1A.

In the embodiment, the transparent layer 5 is provided directly on thelight emitting layer 2. That is, the transparent layer 5 is formed onthe light emitting layer 2 without the bonding layer 3 (referring toFIGS. 1A and 1B) being interposed.

Such a structure is realizable by, for example, the transparent layer 5being formed of a resin. For example, a resin material prior to beingcured is coated onto the first major surface M1 of the light emittinglayer 2. Subsequently, the resin material is cured by heat, UV(ultraviolet), etc. Thereby, the transparent layer 5 can be formeddirectly on the light emitting layer 2.

Or, the transparent layer 5 may be formed on the first major surface M1of the light emitting layer 2 by, for example, coating liquid glass by amethod such as spin coating and by curing the liquid glass.

According to the embodiment, in addition to the various operationaleffects described above in regard to the first embodiment, it ispossible to suppress absorption, scattering, etc., of the light by thebonding layer 3 and further increase the light extraction efficiency.

Because the process of forming the bonding layer 3 can be eliminatedfrom the manufacturing processes, it is possible to shorten theprocesses and reduce the costs.

In the embodiment as well, it is possible to provide the transmissivelayer 5 with the various optical functions described above in regard toFIG. 2A to FIG. 5B. For example, it is sufficient to cure whilecontrolling the configuration of the resin material on the first majorsurface M1 of the light emitting layer using a mold templatecorresponding to a prescribed configuration such as a convex lens, aconcave lens, a Fresnel lens, etc. Alternatively, the resin material onthe first major surface M1 of the light emitting layer 2 may beimprinted (template pressing) by stamping corresponding to a prescribedconfiguration such as a convex lens, a concave lens, a Fresnel lens,etc., prior to the curing.

Third Embodiment

A third embodiment of the invention will now be described with referenceto FIG. 7. Mainly, portions of the embodiment different from those ofthe first and second embodiments will be described. Portions of theembodiment similar to portions described in regard to the first andsecond embodiments are marked with like reference numerals, and adescription thereof is omitted as appropriate.

FIG. 7 is a cross-sectional view illustrating the schematicconfiguration of an optical semiconductor device according to theembodiment.

In the embodiment, a fluorescent layer 4 is provided on the lightemitting layer 2 with the bonding layer 3 interposed. The fluorescentlayer 4 contains a fluorescer particle configured to convert thewavelength of the light emitted from the light emitting layer 2.Specifically, the fluorescent layer 4 has a structure in which thefluorescer particle is dispersed in an organic material such as, forexample, a silicone resin. The fluorescent layer 4 also may have afluorescer particle dispersed in an inorganic material such as, forexample, silicon oxide. The thickness of the fluorescent layer 4 may beabout, for example, 15 micrometers. Alternatively, the fluorescent layer4 may be formed by bonding the fluorescer particles to each other by abinder made of an organic material or an inorganic material.

In the case where a silicone resin is used as the organic material ofthe fluorescent layer 4, the same type of resin as that of the bondinglayer 3, i.e., methyl phenyl silicone having a refractive index of about1.5, can be used. However, the material of the fluorescent layer 4 isnot limited thereto. Other types of organic materials or inorganicmaterials may be used.

It is unnecessary for the fluorescer contained in the fluorescent layer4 to have one composition. For example, a mixture of two types offluorescers that perform wavelength conversions of blue light into greenlight and red light may be used. Thus, white light having high colorrendition can be obtained by mixing the blue light emitted from thelight emitting layer 2 and the green light and the red light undergoingthe wavelength conversion by the fluorescers.

It is unnecessary for the fluorescent layer 4 to be a single layer. Forexample, a stacked body may be used in which a first layer, in which afluorescer particle configured to absorb blue light and emit green lightis dispersed, is stacked with a second layer, in which a fluorescerparticle configured to absorb blue light and emit red light isdispersed. In such a case, losses due to green light being absorbed inthe first layer can be reduced by stacking the first layer and thesecond layer in order from the light emitting layer 2 side.

Red fluorescers may include, for example, the following. However, thered fluorescer of the embodiments is not limited to the following:

Y₂O₂S:Eu

Y₂O₂S:Eu+pigment

Y₂O₃:Eu

Zn₃(PO₄)₂:Mn

(Zn, Cd)S:Ag+In₂O₃

(Y, Gd, Eu)BO₃

(Y, Gd, Eu)₂O₃

YVO₄:Eu

La₂O₂S:Eu, Sm

LaSi₃N₅:Eu²⁺

α-sialon:Eu²⁺

CaAlSiN₃:Eu²⁺

CaSiN_(x):Eu²⁺

CaSiN_(x):Ce²⁺

M₂Si₅N₈:Eu²⁺

CaAlSiN₃:Eu²⁺

(SrCa)AlSiN₃:Eu^(x+)

Sr_(x)(Si_(y)Al₃)_(z)(O_(x)N):Eu^(x+)

Green fluorescers may include, for example, the following. However, thegreen fluorescer of the embodiments is not limited to the following:

ZnS:Cu, Al

ZnS:Cu, Al+pigment

(Zn, Cd)S:Cu, Al

ZnS:Cu, Au, Al, +pigment

Y₃Al₅O₁₂:Tb

Y₃(Al, Ga)₅O₁₂:Tb

Y₂SiO₅:Tb

Zn₂SiO₄:Mn

(Zn, Cd)S:Cu

ZnS:Cu

Zn₂SiO₄:Mn

ZnS:Cu+Zn₂SiO₄:Mn

Gd₂O₂S:Tb

(Zn, Cd)S:Ag

ZnS:Cu, Al

Y₂O₂S:Tb

ZnS:Cu, Al+In₂O₃

(Zn, Cd)S:Ag+In₂O₃

(Zn, Mn)₂SiO₄

BaAl₁₂O₁₉:Mn

(Ba, Sr, Mg)O.aAl₂O₃:Mn

LaPO₄:Ce, Tb

Zn₂SiO₄:Mn

ZnS:Cu

3(Ba, Mg, Eu, Mn)O.8Al₂O₃

La₂O₃.0.2SiO₂.0.9P₂O₅:Ce,Tb

CeMgAl₁₁O₁₉:Tb

CaSc₂O₄:Ce

(BrSr)SiO₄: Eu

α-sialon:Yb²⁺

β-sialon:Eu²⁺

(SrBa)YSi₄N₇:Eu²⁺

(CaSr)Si₂O₄N₇:Eu²⁺

Sr(SiAl)(ON):Ce

Blue fluorescers may include, for example, the following. However, theblue fluorescer of the embodiments is not limited to the following:

ZnS:Ag

ZnS:Ag+pigment

ZnS:Ag, Al

ZnS:Ag, Cu, Ga, Cl

ZnS:Ag+In₂O₃

ZnS:Zn+In₂O₃

(Ba, Eu)MgAl₁₀O₁₇

(Sr, Ca, Ba, Mg)₁₀(PO₄)6Cl₂:Eu

Sr₁₀(PO₄)6Cl₂:Eu

(Ba, Sr, Eu)(Mg, Mn)Al₁₀O₁₇

10(Sr, Ca, Ba, Eu).6PO₄.Cl₂

BaMg₂Al₁₆O₂₅:Eu

Yellow fluorescers may include, for example, the following. However, theyellow fluorescer of the embodiments is not limited to the following:

Li(Eu, Sm)W₂O₈

(Y, Gd)₃, (Al, Ga)₅O₁₂:Ce³⁺

Li₂SrSiO₄:Eu²⁺

(Sr(Ca, Ba))₃SiO₅:Eu²⁺

SrSi₂ON_(2.7):Eu²⁺

According to the structure of the embodiment, light of diversewavelength bands can be obtained by providing the fluorescent layer 4,which performs a wavelength conversion of light, on the light emittinglayer 2. For example, in the case where blue light is emitted from thelight emitting layer 2, white light can be obtained by the fluorescentlayer 4 containing a fluorescer configured to absorb the blue light andemit yellow light. That is, white light is obtained by mixing the bluelight from the light emitting layer 2 and the yellow light from thefluorescent layer 4.

According to the structure of the embodiment, the optical semiconductordevice 1C can emit white light in the upper surface direction byemitting the blue light only in the upward direction by forming thereflective layer 6 on the lower surface (in FIG. 7) of the lightemitting layer 2.

By dispersing a fluorescer particle in a material such as resin, glass,etc., as the fluorescent layer 4, the light extraction efficiency can beincreased because it is possible to reduce the refractive indexdifference between the fluorescent layer 4 and the air.

In the specific example as illustrated in FIG. 7, the fluorescent layer4 includes a portion outside the circumferential edge of the lightemitting layer 2 when viewed along the stacking direction from the firstmajor surface M1 toward the second major surface M2. In other words, thefluorescent layer 4 juts outside the light emitting layer 2 when viewedin plan. Thereby, the light emitted from the light emitting layer 2efficiently passes through the fluorescent layer 4; and the conversionefficiency of the wavelength of the light can be increased.

Fourth Embodiment

A fourth embodiment of the invention will now be described withreference to FIG. 8. Mainly, portions of the embodiment different fromthose of the first to third embodiments will be described. Portions ofthe embodiment similar to portions described in regard to the first tothird embodiments are marked with like reference numerals, and adescription thereof is omitted as appropriate.

FIG. 8 is a cross-sectional view illustrating the schematicconfiguration of an optical semiconductor device according to theembodiment.

In the embodiment, the fluorescent layer 4 is provided directly on thelight emitting layer 2. In other words, the fluorescent layer 4 isformed on the light emitting layer 2 without the bonding layer 3(referring to FIG. 7) being interposed.

Such a structure is realizable by, for example, forming the fluorescentlayer 4 using a resin. For example, a resin material, in which afluorescer particle is dispersed, is coated onto the first major surfaceM1 of the light emitting layer 2 prior to being cured. Subsequently, theresin material is cured using heat, UV (ultraviolet), etc. Thereby, thefluorescent layer 4 can be formed directly on the light emitting layer2. It is advantageous to use a silicone resin as the resin included inthe fluorescent layer 4 because the durability to blue light andultraviolet light is high, and degradation such as discoloration can besuppressed even when turned on for long periods of time.

Or, the fluorescent layer 4 can be formed on the first major surface M1of the light emitting layer 2 by, for example, using a method such asspin coating to coat liquid glass in which a fluorescer particle isdispersed and by curing the liquid glass. In such a case as well, it isadvantageous because glass has a high durability to blue light andultraviolet light, and degradation such as discoloration can besuppressed even when turned on for long periods of time.

Alternatively, the fluorescent layer 4 may be formed on the lightemitting layer 2 using sputtering or CVD (Chemical Vapor Deposition). Inother words, the material of the fluorescer may be deposited on thelight emitting layer 2 using sputtering or CVD. Thus, it is possible toform a fluorescent layer 4 that contains the fluorescer with a highconcentration.

In the embodiment as well, it is unnecessary for the fluorescent layer 4to be a single layer. For example, a stacked body may be used in which afirst layer, in which a fluorescer particle configured to absorb theblue light and emit green light is dispersed, is stacked with a secondlayer, in which a fluorescer particle configured to absorb the bluelight and emit red light is dispersed.

According to the embodiment, in addition to the various operationaleffects described above in regard to the third embodiment, it ispossible to suppress absorption, scattering, etc., of the light by thebonding layer 3 and further increase the light extraction efficiency.

Fifth Embodiment

A fifth embodiment of the invention will now be described with referenceto FIGS. 9A to 9D. Mainly, portions of the embodiment different fromthose of the first to fourth embodiments will be described. Portions ofthe embodiment similar to portions described in regard to the first tofourth embodiments are marked with like reference numerals, and adescription thereof is omitted as appropriate.

FIGS. 9A to 9D are cross-sectional views illustrating the schematicconfiguration of optical semiconductor devices according to theembodiment.

As shown in FIG. 9A, in the optical semiconductor device 1E according tothe embodiment, the transparent layer 5 and the fluorescent layer 4 areprovided in this order on the light emitting layer 2 with the bondinglayer 3 interposed. The bonding layer 3 and the transparent layer 5 maybe similar to those described above in regard to the first embodiment.The fluorescent layer 4 may be similar to those described above inregard to the third and fourth embodiments.

For example, a resin material, in which a fluorescer particle isdispersed, is coated onto the transparent layer 5 prior to being cured.Subsequently, the resin material is cured by heat, UV (ultraviolet),etc. Thereby, the fluorescent layer 4 can be formed directly on thetransparent layer 5. Thus, it is sufficient for the transparent layer 5having the fluorescent layer 4 formed thereon to be bonded to the lightemitting layer 2 with the bonding layer 3 interposed.

It is advantageous to use a silicone resin as the resin included in thefluorescent layer 4 because the durability to blue light and ultravioletlight is high, and degradation such as discoloration can be suppressedeven when turned on for long periods of time.

Or, the fluorescent layer 4 can be formed on the transparent layer 5 by,for example, using a method such as spin coating to coat liquid glass inwhich a fluorescer particle is dispersed and by curing the liquid glass.In such a case as well, it is advantageous because glass has a highdurability to blue light and ultraviolet light, and degradation such asdiscoloration can be suppressed even when turned on for long periods oftime.

Alternatively, the fluorescent layer 4 may be formed on the transparentlayer 5 using sputtering or CVD (Chemical Vapor Deposition). In otherwords, the material of the fluorescer can be deposited on the lightemitting layer 2 using sputtering or CVD. Thus, it is possible to form afluorescent layer 4 that contains the fluorescer with a highconcentration.

According to the embodiment, it is possible to increase the uniformityof the light distribution characteristics or the distribution of theluminance by first guiding the light emitted from the light emittinglayer 2 into the transparent layer 5. In other words, it is possible forthe transparent layer 5 to act as a light guide to reduce unevenness ofthe luminance of the light when the light emitted from the lightemitting layer 2 enters the transparent layer 5 and propagates throughthe transparent layer 5. It is possible to increase the uniformity ofuneven color of the light emitted to the outside by the light having thereduced luminance unevenness entering the fluorescent layer 4 andundergoing wavelength conversion.

For example, in the case where white light is extracted to the outsideby blue light being emitted from the light emitting layer 2 and aportion thereof being converted into yellow light in the fluorescentlayer 4, there are cases where the blue component becomes intense if theintensity of the blue light entering the fluorescent layer 4 is high.That is, unevenness occurs in the blue component of the white lightextracted to the outside via the fluorescent layer 4 in the case wherethere is unevenness in the luminance of the blue light emitted from thelight emitting layer 2. This may be recognized as uneven color by theobserver.

Conversely, in the embodiment, unevenness of the luminance is reduced bythe light emitted from the light emitting layer 2 first being guidedinto the transparent layer 5 and guided therethrough. As a result, theuneven color of the light extracted to the outside also can bemitigated.

As shown in FIGS. 9B and 9C, in other optical semiconductor devices 1Eband 1Ec according to the embodiment, a light shield layer 10 a isprovided on the side face of the transparent layer 5. A material usedfor the light shield layer 10 a may be same as a material used for thesealing layer 10. Or, the material used for the light shield layer 10 amay be different from the material used for the sealing layer 10.

As shown in FIG. 9D, in another optical semiconductor device 1Edaccording to the embodiment, the fluorescent layer 4 is provided furtheron the side face of the transparent layer 5.

By the optical semiconductor devices 1Eb, 1Ec and 1Ed, light passingthrough the transparent layer 5 does not exit to the outside directly.Thereby, the uneven color of the light extracted to the outside also canbe further mitigated.

Sixth Embodiment

A sixth embodiment of the invention will now be described with referenceto FIGS. 10A to 10D. Mainly, portions of the embodiment different fromthose of the first to fifth embodiments will be described. Portions ofthe embodiment similar to portions described in regard to the first tofifth embodiments are marked with like reference numerals, and adescription thereof is omitted as appropriate.

FIGS. 10A to 10D are cross-sectional views illustrating the schematicconfiguration of optical semiconductor devices according to theembodiment.

As shown in FIG. 10A, in the optical semiconductor device 1E accordingto the embodiment, the transparent layer 5 and the fluorescent layer 4are provided in this order on the light emitting layer 2. That is, thetransparent layer 5 and the fluorescent layer 4 are provided directly onthe light emitting layer 2 without the bonding layer 3 (referring toFIG. 9A) being interposed.

The transparent layer 5 may be similar to that described above in regardto the second embodiment. The fluorescent layer 4 may be similar tothose described above in regard to the third to fifth embodiments.

In the embodiment as well, the effects described above in regard to thefifth embodiment can be obtained similarly by providing the transparentlayer 5 and the fluorescent layer 4 in this order on the light emittinglayer 2.

In the embodiment, the absorption, scattering, etc., of the light by thebonding layer 3 is suppressed and the light extraction efficiency can beincreased further because the bonding layer 3 is not used.

Because the process of forming the bonding layer 3 can be eliminatedfrom the manufacturing processes, it is possible to shorten theprocesses and reduce the costs.

As shown in FIGS. 10B and 10 c, in other optical semiconductor devices1Fb and 1Fc according to the embodiment, a light shield layer 10 a isprovided on the side face of the transparent layer 5. A material usedfor the light shield layer 10 a may be same as a material used for thesealing layer 10. Or, the material used for the light shield layer 10 amay be different from the material used for the sealing layer 10.

As shown in FIG. 10D, in another optical semiconductor device 1Fdaccording to the embodiment, the fluorescent layer 4 is provided furtheron the side face of the transparent layer 5.

By the optical semiconductor devices 1Fb, 1Fc and 1Fd, light passingthrough the transparent layer 5 does not exit to the outside directly.Thereby, the uneven color of the light extracted to the outside also canbe further mitigated.

Seventh Embodiment

A seventh embodiment of the invention will now be described withreference to FIG. 11. Mainly, portions of the embodiment different fromthose of the first to sixth embodiments will be described. Portions ofthe embodiment similar to portions described in regard to the first tosixth embodiments are marked with like reference numerals, and adescription thereof is omitted as appropriate.

FIG. 11 is a cross-sectional view illustrating the schematicconfiguration of an optical semiconductor device according to theembodiment.

In the optical semiconductor device 1G according to the embodiment, thefirst metal layer 11 a and the second metal layers 11 b are solderbumps. In other words, a solder bump having a hemisphericalconfiguration of 100 micrometers in diameter is formed on the firstmetal post 8 a and each of the second metal posts 8 b. The compositionof the solder bump is that of a solder material used in surface mountingsuch as Sn-3.0Ag-0.5Cu, Sn-0.8Cu, Sn-3.5Ag, etc.

According to the embodiment, effects similar to those of the firstembodiment can be obtained. Also, in the case where the opticalsemiconductor device 1G is mounted to a wiring substrate, because thefirst metal layer 11 a and the second metal layer 11 b are formed ofsolder bumps, the stress occurring due to the linear coefficient ofthermal expansion difference when heating can be mitigated furtherbecause the gap between the optical semiconductor device 1G and thewiring substrate is higher than that of the optical semiconductor device1A according to the first embodiment due to the solder bumps.

Metal bumps formed of, for example, indium, etc., may be providedinstead of the solder bumps. The bonding of such metal bumps is possibleby compression bonding while applying, for example, heat and/orultrasonic waves.

Although the structure of the first embodiment is illustrated in FIG.11, the embodiment is not limited thereto. In other words, similaroperational effects can be obtained by providing solder bumps or metalbumps in any of the second to sixth embodiments.

Eighth Embodiment

An eighth embodiment of the invention will now be described withreference to FIGS. 12A and 12B. Portions of the eighth embodiment of theinvention different from those of the first to seventh embodiments willbe described. Portions of the eighth embodiment similar to portionsdescribed in regard to the first to seventh embodiments are marked withlike reference numerals, and a description is omitted.

FIG. 12A is a cross-sectional view illustrating the schematicconfiguration of an optical semiconductor device according to theembodiment. FIG. 12B is a plan view illustrating the lower surface ofthe optical semiconductor device illustrated in FIG. 12A.

In the optical semiconductor device 1H according to the embodiment, asquare first electrode 7 a, for example, having sides of 100 micrometersis formed on the lower surface of the first cladding layer 2 a. On theother hand, the second electrode 7 b of the lower surface of the secondcladding layer 2 b has a configuration of, for example, a square havingsides of 500 micrometers from which a square corner region of the firstcladding layer 2 a having sides of, for example, 150 micrometers isremoved. The configuration of the first metal post 8 a is a prism havinga rectangular parallelepiped configuration with the same planarconfiguration as that of the first electrode 7 a; and the configurationof the second metal post 8 b is a prism with the same planarconfiguration as that of the second electrode 7 b. The first metal layer11 a has the same planar configuration as the first electrode 7 a; andthe second metal layer 11 b has the same planar configuration as thesecond electrode 7 b (referring to FIG. 12B).

According to the embodiment, effects similar to those of the firstembodiment can be obtained. Compared to the optical semiconductor device1A according to the first embodiment, the amount of heat generated whena current is input can be reduced and excessive thermal resistance canbe drastically reduced due to the decrease of the thermal resistancebecause the heat dissipation path for releasing the heat generated bythe light emission is increased by increasing the planar surface areasof the first electrode 7 a and the second electrode 7 b, that is, byenlarging the first metal post 8 a and the second metal post 8 b.

Although the structure of the first embodiment is illustrated in FIGS.12A and 12B, the embodiment is not limited thereto. In other words, theamount of heat generated when a current is input can be reduced and theexcessive thermal resistance can be drastically reduced due to thedecrease of the thermal resistance by increasing the planar surfaceareas of the first electrode 7 a and the second electrode 7 b in any ofthe second to sixth embodiments.

Ninth Embodiment

A ninth embodiment of the invention will now be described with referenceto FIG. 13A to FIG. 15D. The embodiment is a method for manufacturingthe optical semiconductor device 1A according to the first embodimentand the optical semiconductor device 1C according to the thirdembodiment. Portions in the description of the embodiment similar toportions described in regard to the first to eighth embodiments aremarked with like reference numerals, and a description is omitted.

FIG. 13A to FIG. 15D are cross-sectional views of processes,illustrating the method for manufacturing the optical semiconductordevice of the embodiment. Here, the method for manufacturing the opticalsemiconductor device 1A according to the first embodiment is illustratedas an example.

First, as illustrated in FIG. 13A, a light emitting layer 12 of, forexample, InGaN that emits blue light is formed on a substrate 11, whichis, for example, a sapphire wafer having a diameter of 2 inches and athickness of 200 micrometers. First, an initial light emitting layerused to form the light emitting layer 12 is epitaxially grown as a film;and the light emitting layer is singulated using RIE (reactive ionetching). Thereby, the light emitting layer 2 of the opticalsemiconductor device 1A is formed. The light emitting layer 2 is formedby, for example, forming the first cladding layer 2 a in a film in asquare region having sides of 550 micrometers and by forming the secondcladding layer 2 b in a film with the active layer 2 c interposed on thelower surface of the first cladding layer 2 a in a region excluding thecorner region of the first cladding layer 2 a (the square having sidesof 150 micrometers) (referring to FIGS. 1A and 1B).

Then, as illustrated in FIG. 13B, a multilayered film 13 is formed oneach of the light emitting layers 12 on the substrate 11. First, a Ni/Aufilm (not illustrated) is formed with thicknesses of 0.1 micrometers/0.1micrometers on the entire front surface of the light emitting layer 12as the contact layer of the light emitting layer 12 by sputtering. Ametal film (not illustrated) of Ag or Al is formed on this film with athickness of 0.3 micrometers by sputtering. Thereby, the reflectivelayer 6 of the optical semiconductor device 1A is formed. Subsequently,a Ni/Au film (not illustrated) is formed with thicknesses of 0.1micrometers/0.1 micrometers in the electrode portions of the lightemitting layer 12 as the electrode material; and a passivation film (notillustrated) of a SiO₂ film is formed with a thickness of 0.3micrometers in a region other than the electrode portions by sputtering.Thereby, the first electrode 7 a, the second electrodes 7 b, and theinsulating layer 9 of the optical semiconductor device 1A are formed.Thus, the multilayered film 13 is formed on each of the light emittinglayers 2 on the substrate 11.

Continuing as illustrated in FIG. 13C, a seed layer 14, which is anelectrically conductive film used to form a power supply layer ofplating, is formed over the entire surface of the substrate 11 using aphysical covering method such as vapor deposition, sputtering, etc. Astacked film such as, for example, Ti/Cu is used as the seed layer 14.Here, the Ti layer is formed to increase the adhesion strength with theresist and the pads. Accordingly, the film thickness thereof may beabout 0.1 micrometers. On the other hand, it is favorable for the filmthickness of the Cu to be not less than 0.2 micrometers because the Cucontributes mainly to the power supply.

Then, as illustrated in FIG. 13D, a resist layer 15, which is asacrificial layer in which holes are made at the electrode pad portionswhich are the portions of the first electrode 7 a and the secondelectrodes 7 b, is formed over the entire surface of the substrate 11.It is possible to use a photosensitive liquid resist or dry film resistas the resist. The resist layer 15 is formed on the entire surface ofthe substrate 11 by first forming an initial resist layer used to formthe resist layer 15 and by subsequently making openings by exposing anddeveloping using a light-shielding mask. The resist is baked after thedeveloping if necessary according to the material.

Continuing as illustrated in FIG. 14A, a plating layer 16 is formed inthe openings of the resist layer 15 using electroplating. Thereby, eachof the metal posts 8 a and 8 b of the optical semiconductor device 1A isformed. When electroplating, for example, the substrate 11 of the waferis immersed in a plating liquid made of copper sulfate and sulfuricacid; the negative terminal of a direct-current power source isconnected to the seed layer 14; the positive terminal of thedirect-current power source is connected to a Cu plate used as the anodedisposed to oppose the surface to be plated of the substrate 11; acurrent flows; and the Cu plating starts. Although the thickness of theplating film increases as time elapses, the plating is completed bystopping the flow of current prior to the thickness reaching thethickness of the resist layer 15.

After the plating as illustrated in FIG. 14B, the resist layer 15 isremoved by being peeled from the substrate 11. Subsequently, the seedlayer 14 is removed by etching using acid cleaning. Thereby, the lightemitting layer 12, the multilayered film 13, and the plating layer 16are exposed.

Then, as illustrated in FIG. 14C, a thermosetting resin layer 17 used toform the sealing layer is formed over the entire surface of thesubstrate 11. First, a thermosetting resin is supplied around theplating layer 16 with a thickness thick enough to bury the plating layer16 by spin coating; and subsequently, the thermosetting resin layer 17is cured by heating by being placed in an oven. The resin is cured bybeing heated at, for example, 150° C. for 2 hours.

Subsequently, as illustrated in FIG. 14D, the plating layer 16 isexposed by polishing the front surface of the thermosetting resin layer17. Thereby, the sealing layer 10 of the optical semiconductor device 1Ais formed. By using a rotating polishing wheel to polish thethermosetting resin layer 17, it is possible to complete the polishingwhile ensuring the planarity by rotational polishing. After completingthe polishing, drying may be performed if necessary. This polishingprocess is necessary to expose the end portion of the plating layer 16after the spin coating because it is difficult (the coating time andcost increase) to coat the thermosetting resin while leaving exposedonly the end portion of the plating layer 16 when using spin coating,etc., in the previous process.

Then, as illustrated in FIG. 15A, lift-off of the light emitting layer12 from the substrate 11 is performed by irradiating a laser between thelayers of the substrate 11 and the light emitting layer 12. That is, thelight emitting layer 12 is separated and peeled from the substrate 11.Thereby, the light emitting layer 12, the multilayered film 13, theplating layer 16, and a light emitting base member 12A made of thethermosetting resin layer 17 are separated from the substrate 11. Thelift-off is performed by irradiating laser light having a wavelength of355 nm through the substrate 11 between the layers of the light emittinglayer 12 and the substrate 11 using a Nd:YAG third harmonic laser. Thelift-off is an option and may be omitted.

Although a specific example in which a gallium nitride-based crystal isgrown on the substrate 11 of the sapphire wafer and separated from thesubstrate 11 is illustrated herein, the embodiment is not limitedthereto. For example, it is also possible to form the light emittinglayer 12 by growing an InGaAlP-based crystal on a substrate of GaAs andremoving the GaAs substrate using a method such as etching. Although thelight emission obtained from the InGaAlP-based crystal is undesirablyabsorbed by the GaAs substrate, the light emitted from the InGaAlP-basedlight emitting layer can be extracted to the outside without beingabsorbed by the GaAs substrate by the GaAs substrate being thus removed.

Then, as illustrated in FIG. 15B, the light emitting base member 12Aformed by the lift-off is bonded onto a transparent base member 18 suchas an optical glass wafer with the light emitting layer 12 toward thetransparent base member 18 and with a bonding layer 20 interposed. In aseparate process, a silicone resin layer is formed as the bonding layer20 on the transparent base member 18 made of a transparent inorganicsubstance. Thus, the transparent layer 5 and the bonding layer 3 of theoptical semiconductor device 1A are formed.

Here, the bonding between the transparent base member 18 and the lightemitting layer 12 is performed by supplying a silicone resin onto thetransparent base member 18 by spraying, subsequently bonding afterperforming positional alignment, and curing and bonding by placing thelight emitting base member 12A and the transparent base member 18 intoan oven in the bonded state. The curing of the silicone resin ispossible by heating at, for example, 150° C. for 1 hour.

Then, as illustrated in FIG. 15C, a Ni/Au layer 21 is formed on the Cuelectrode of the plating layer 16 using electroless plating. Thereby,the metal layers 11 a and 11 b of the optical semiconductor device 1Aare formed. In the electroless plating of the Ni, the Ni layer is formedin a film by, for example, performing degreasing by processing for 3minutes in a weakly alkaline degreasing liquid, performing water rinseby processing for 1 minute in running water, performing acid rinse,subsequently immersing the wafer in a nickel-phosphorus plating liquidtemperature-controlled to 70° C., and subsequently performing waterrinse. In the electroless plating of the Au, the plating is performed onthe Cu electrode surface by immersing the wafer in an electroless goldplating liquid temperature-controlled to 70° C. and subsequentlyperforming water rinse and drying.

Finally, as illustrated in FIG. 15D, the multiple optical semiconductordevices 1A are cut out by dicing using a dicer; and the opticalsemiconductor device 1A according to the first embodiment is obtained.The same processes as those described above may be used as themanufacturing processes of the optical semiconductor device 1H accordingto the eighth embodiment; and the optical semiconductor device 1Haccording to the eighth embodiment can be obtained by modifying theopening size and the configuration of the resist layer 15.

On the other hand, the optical semiconductor device 1C according to thethird embodiment can be obtained by using a fluorescent base member toform the fluorescent layer 4 instead of the transparent base member 18of the processes illustrated in FIGS. 15B and 15C, bonding thefluorescent base member to the light emitting base member 12A by thebonding layer 20, and performing the dicing as illustrated in FIG. 15D.

According to the embodiment as described above, the opticalsemiconductor devices 1A and 1C according to the first and thirdembodiments can be manufactured; and as a result, effects similar tothose of the first and third embodiments can be obtained. The opticalsemiconductor device 1H according to the eighth embodiment can bemanufactured by modifying the opening size and the configuration of theresist layer 15; and as a result, effects similar to those of the eighthembodiment can be obtained. Because it is possible to manufacture manyoptical semiconductor devices 1A, 1C, and 1H by performing themanufacturing processes once, mass production of the opticalsemiconductor devices 1A, 1C, and 1H can be realized; and as a result,the costs of the optical semiconductor devices 1A, 1C, and 1H can bereduced.

Here, the layer made of the resin and metal is flexible, and the metalis formed by plating at near room temperature. Hence, the residualstress occurring with respect to the substrate 11 is relatively low. Inthe conventional technique for separating the light emitting layer 12from the substrate 11 at wafer level, for example, it is bonded to asilicon substrate with a metal layer formed thereon using Au—Sn solderat a high temperature of 300° C. or more, and then the light emittinglayer 12 made of GaN is separated by laser irradiation. However, in thisconventional technique, the substrate 11 and the silicon substrate beingdifferent in thermal expansion coefficient are both rigid, and arebonded together at high temperature. Hence, a high residual stressremains between these substrates. Consequently, when the separation isstarted by laser irradiation, the residual stress is locally relievedfrom the separated portion and unfortunately causes cracks in the thin,brittle light emitting layer 12. In contrast, in this embodiment, theresidual stress is low, and the light emitting layer 12 is separated inthe state of being fixed to a flexible support. Hence, the device can bemanufactured at high yield without trouble such as cracking in the lightemitting layer 12.

Tenth Embodiment

A tenth embodiment of the invention will now be described with referenceto FIGS. 16A to 16C. The embodiment is a method for manufacturing anoptical semiconductor device 1B according to the second embodiment.Portions described in regard to the embodiment similar to portionsdescribed in regard to the first to ninth embodiments are marked withlike reference numerals, and a description is omitted.

FIGS. 16A to 16C are cross-sectional views of processes, illustrating aportion of the method for manufacturing the optical semiconductor deviceof the embodiment.

The processes up to the process illustrated in FIG. 16A may be similarto those described above in regard to FIG. 13A to FIG. 15A.

As described above in regard to FIG. 15A, lift-off of the light emittingbase member 12A from the substrate 11 is performed by irradiating alaser between the layers of the substrate 11 and the light emittinglayer 12.

Then, as illustrated in FIG. 16A, a transparent base member 42 is formedon the surface on the light emitting layer 12 side of the light emittingbase member 12A formed by the lift-off. The transparent base member 42is formed, for example, by coating liquid glass using a method such asspin coating and by curing. Other than spin coating, it is also possibleto supply the liquid glass by spraying; and the supply method is notlimited. It is possible to perform the curing of the glass layer byheating at, for example, 200° C. for 1 hour.

Other than liquid glass, the film formation material of the transparentlayer 42 may be appropriately selected according to the application.

Or, a material such as silicon oxide may be deposited using a methodsuch as sputtering, CVD (Chemical Vapor Deposition), etc.

Alternatively, a resin material such as a silicone resin may be formedby being coated onto the light emitting base member 12A by spin coating,etc., and subsequently being placed in an oven and cured using UV(ultraviolet). The silicone resin may include a substance that cureswhen heated at, for example, 150° C. for 1 hour. To form the transparentbase member 42 in a film with a uniform thickness, the silicone resin issupplied onto the light emitting base member 12A; subsequently, a spaceris formed; a fluorinated jig having high peelability is bonded to thefront surface; and curing is performed. Thereby, it is possible to formthe silicone resin film with a uniform thickness by suppressing thecurve of the front surface due to the surface tension of the resin.Then, as illustrated in FIG. 16B, a Ni/Au layer 43 is formed on the Cuelectrode of the plating layer 16 using electroless plating. Thereby,the metal layers 11 a and 11 b of the optical semiconductor device 1Bare formed. In the electroless plating of the Ni and the electrolessplating of the Au, plating is performed similarly to the formationprocess of the Ni/Au layer 21 according to the ninth embodiment.

Finally, as illustrated in FIG. 16C, the multiple optical semiconductordevices 1B are cut out by dicing using a dicer; and the opticalsemiconductor device 1B according to the second embodiment is obtained.

According to the embodiment as described above, the opticalsemiconductor device 1B according to the second embodiment can bemanufactured; and as a result, effects similar to those of the secondembodiment can be obtained. Because it is possible to manufacture manyoptical semiconductor devices 1B by performing the manufacturingprocesses once, mass production of the optical semiconductor device 1Bcan be realized; and as a result, the costs of the optical semiconductordevice 1B can be reduced.

Eleventh Embodiment

An eleventh embodiment of the invention will now be described withreference to FIGS. 17A to 17C. In the embodiment, a method formanufacturing an optical semiconductor device 1D according to the fourthembodiment will be described. Portions of the embodiment similar toportions described in regard to the first to tenth embodiments aremarked with like reference numerals, and a description is omitted.

FIGS. 17A to 17C are cross-sectional views of processes, illustrating aportion of the method for manufacturing the optical semiconductor deviceof the embodiment.

The manufacturing processes according to the embodiment are similar tothe processes of the ninth embodiment from the film formation process ofthe light emitting layer 12 illustrated in FIG. 13A up to the lift-offprocess illustrated in FIG. 15A.

After the lift-off process, as illustrated in FIG. 17A, a fluorescentlayer 41 is formed on the surface of the light emitting base member 12Aon the light emitting layer 12 side. The fluorescent layer 41 is formedof a silicone resin, liquid glass, etc., into which a fluorescerparticle is mixed. Thereby, the fluorescent layer 4 of the opticalsemiconductor device 1D is formed.

Here, the fluorescer particle and the silicone resin (or the liquidglass, etc.) may be formed by, for example, being mixed uniformly in aplanetary mixing apparatus, subsequently being supplied onto the lightemitting base member 12A by spin coating, and subsequently being placedinto an oven and cured. A substance that cures when heated at, forexample, 150° C. for hour may be used as the silicone resin. To form thefluorescent layer 4 in a film with a uniform thickness, a silicone resinis supplied onto the light emitting base member 12A; subsequently, aspacer is formed; a fluorinated jig having high peelability is bonded tothe front surface; and curing is performed. Thereby, it is possible toform the silicone resin film with a uniform thickness by suppressing thecurve of the front surface due to the surface tension of the resin.

Or, it is also possible to form the fluorescent layer 41 on the lightemitting base member 12A using sputtering. At this time, it is alsopossible to stack the fluorescent layer 41 by performing sputteringmultiple times; and the optical semiconductor device 1D according to thefourth embodiment can be manufactured. It is also possible to form thefluorescent layer 41 in a film using a CVD apparatus.

It is possible to form a fluorescent layer 41 containing a fluorescerhaving a high concentration by depositing the material of the fluorescerusing sputtering or CVD.

Then, as illustrated in FIG. 17B, the Ni/Au layer 43 is formed on the Cuelectrode of the plating layer 16 using electroless plating. Thereby,the metal layers 11 a and 11 b of the optical semiconductor device 1Dare formed. In the electroless plating of the Ni and the electrolessplating of the Au, plating is performed similarly to the formationprocess of the Ni/Au layer 21 according to the ninth embodiment.

Finally, as illustrated in FIG. 17C, the multiple optical semiconductordevices 1D are cut out by dicing using a dicer; and the opticalsemiconductor device 1D according to the fourth embodiment is obtained.

According to the embodiment as described above, the opticalsemiconductor device 1D according to the fourth embodiment can bemanufactured; and as a result, effects similar to those of the fourthembodiment can be obtained. Because it is possible to manufacture manyoptical semiconductor devices 1D by performing the manufacturingprocesses once, mass production of the optical semiconductor device 1Dcan be realized; and as a result, the costs of the optical semiconductordevice 1D can be reduced.

Twelfth Embodiment

A twelfth embodiment of the invention will now be described withreference to FIGS. 18A to 18D. The embodiment is a method formanufacturing an optical semiconductor device 1E according to the fifthembodiment. Portions described in regard to the embodiment similar toportions described in regard to the first to eleventh embodiments aremarked with like reference numerals, and a description is omitted.

FIGS. 18A to 18D are cross-sectional views of processes, illustrating aportion of the method for manufacturing the optical semiconductor deviceof the embodiment.

The processes up to the process illustrated in FIG. 18A may be similarto those described above in regard to FIG. 13A to FIG. 15D.

Then, as illustrated in FIG. 18A, lift-off of the light emitting layer12 from the substrate 11 is performed by irradiating a laser between thelayers of the substrate 11 and the light emitting layer 12.

Continuing as illustrated in FIG. 18B, the transparent base member 18,which is an optical glass wafer on which a fluorescent layer 19 isprovided, etc., is bonded to the light emitting layer 2 of the lightemitting base member 12A formed by the lift-off with the bonding layer20 interposed. In a separate process, a fluorescent base member isformed, that is, a silicone resin layer into which a fluorescer particleis mixed, etc., are formed as the fluorescent layer 19 on thetransparent base member 18 made of a transparent inorganic substance ororganic substance. Then, a silicone resin layer is formed on thetransparent base member 18 as the bonding layer 20. Thus, thefluorescent layer 4, the transparent layer 5, and the bonding layer 3 ofthe optical semiconductor device 1E are formed. For example, the processof forming the transparent layer 5 (the process of adhering thetransparent layer 5) may include the process of stacking the fluorescentlayer 19 on the transparent layer 5.

Here, the fluorescer particle and the silicone resin may be formed by,for example, being mixed uniformly in a planetary mixing apparatus,subsequently being supplied onto the transparent base member 18 by spincoating, and subsequently being placed into an oven and cured. Asubstance that cures when heated at, for example, 150° C. for 1 hour maybe used as the silicone resin. To form the fluorescent layer 4 in a filmwith a uniform thickness, the silicone resin is supplied onto thetransparent base member 18; subsequently, a spacer is formed; afluorinated jig having high peelability is bonded to the front surface;and curing is performed. Thereby, it is possible to form the siliconeresin film with a uniform thickness by suppressing the curve of thefront surface due to the surface tension of the resin.

The bonding of the transparent base member 18, on which the fluorescentlayer 19 is formed, and the light emitting layer 12 may be performed bysupplying a silicone resin onto the transparent base member 18 byspraying, subsequently bonding after performing positional alignment,and performing curing and bonding by placing the light emitting basemember 12A and the transparent base member 18 into an oven in the bondedstate. It is possible to cure the silicone resin by heating at, forexample, 150° C. for 1 hour.

Then, as illustrated in FIG. 18C, the Ni/Au layer 21 is formed. Thereby,the metal layers 11 a and 11 b of the optical semiconductor device 1Aare formed.

Finally, as illustrated in FIG. 18D, the multiple optical semiconductordevices 1E are cut out by dicing using a dicer; and the opticalsemiconductor device 1E according to the fifth embodiment is obtained.

According to the embodiment as described above, the opticalsemiconductor device 1E according to the fifth embodiment can bemanufactured; and as a result, effects similar to those of the fifthembodiment can be obtained. The optical semiconductor device 1Haccording to the eighth embodiment can be manufactured by modifying theopening size and the configuration of the resist layer 15; and as aresult, effects similar to those of the eighth embodiment can beobtained. Because it is possible to manufacture many opticalsemiconductor devices 1E and 1H by performing the manufacturingprocesses once, mass production of the optical semiconductor devices 1Eand 1H can be realized; and as a result, the costs of the opticalsemiconductor devices 1E and 1H can be reduced.

Thirteenth Embodiment

A thirteenth embodiment of the invention will now be described withreference to FIGS. 19A to 19D. The embodiment is a method formanufacturing an optical semiconductor device 1F according to the sixthembodiment.

Portions described in regard to the embodiment similar to portionsdescribed in regard to the first to twelfth embodiments are marked withlike reference numerals, and a description is omitted.

FIGS. 19A to 19D are cross-sectional views of processes, illustrating aportion of the method for manufacturing the optical semiconductor deviceof the embodiment.

The processes up to the process illustrated in FIG. 19A may be similarto those described above in regard to FIG. 13A to FIG. 15A.

Then, as described above in regard to FIG. 15A, lift-off of the lightemitting base member 12A from the substrate 11 is performed byirradiating a laser between the layers of the substrate 11 and the lightemitting layer 12.

Continuing as illustrated in FIG. 19A, the transparent base member 42 isformed on the surface on the light emitting layer 12 side of the lightemitting base member 12A formed by the lift-off. The transparent basemember 42 is formed, for example, by coating liquid glass using a methodsuch as spin coating and by curing. Other than spin coating, it is alsopossible to supply the liquid glass by spraying; and the supply methodis not limited. It is possible to perform the curing of the glass layerby heating at, for example, 200° C. for 1 hour. Other than liquid glass,the film formation material of the transparent layer 42 may beappropriately selected according to the application.

Or, a material such as silicon oxide may be deposited using a methodsuch as sputtering, CVD (Chemical Vapor Deposition), etc.

Alternatively, a resin material such as a silicone resin may be formedby being coated onto the light emitting base member 12A by spin coating,etc., and subsequently being placed in an oven and cured using UV(ultraviolet). A substance that cures when heated at, for example, 150°C. for 1 hour may be used as the silicone resin. To form the transparentbase member 42 in a film with a uniform thickness, the silicone resin issupplied onto the light emitting base member 12A; subsequently, a spaceris formed; a fluorinated jig having high peelability is bonded to thefront surface; and curing is performed. Thereby, it is possible to formthe silicone resin film with a uniform thickness by suppressing thecurve of the front surface due to the surface tension of the resin.

Then, as illustrated in FIG. 19B, the fluorescent layer 41 is formed onthe transparent base member 42. The fluorescent layer 41 is formed of asilicone resin, liquid glass, etc., into which a fluorescer particle ismixed. Thereby, the fluorescent layer 4 of the optical semiconductordevice 1F is formed.

Here, the fluorescer particle and the silicone resin (or the liquidglass, etc.) may be formed by, for example, being mixed uniformly in aplanetary mixing apparatus, subsequently being supplied onto thetransparent base member 42 by spin coating, and subsequently beingplaced in an oven and cured. A substance that cures when heated at, forexample, 150° C. for 1 hour may be used as the silicone resin. To formthe fluorescent layer 4 in a film with a uniform thickness, the siliconeresin is supplied onto the transparent base member 42; subsequently, aspacer is formed; a fluorinated jig having high peelability is bonded tothe front surface; and curing is performed. Thereby, it is possible toform the silicone resin film with a uniform thickness by suppressing thecurve of the front surface due to the surface tension of the resin.

Or, it is also possible to form the fluorescent layer 41 on thetransparent base member 42 using sputtering. At this time, it is alsopossible to stack the fluorescent layer 41 by performing sputteringmultiple times. The fluorescent layer 41 also may be formed using a CVDapparatus. It is possible to form a fluorescent layer 41 containing afluorescer having a high concentration by depositing the material of thefluorescer using sputtering or CVD.

Then, as illustrated in FIG. 19C, the Ni/Au layer 43 is formed on the Cuelectrode of the plating layer 16 using electroless plating. Thereby,the metal layers 11 a and 11 b of the optical semiconductor device 1Fare formed. In the electroless plating of the Ni and the electrolessplating of the Au, plating is performed similarly to the formationprocess of the Ni/Au layer 21 according to the ninth embodiment.

Finally, as illustrated in FIG. 19D, the multiple optical semiconductordevices 1F are cut out by dicing using a dicer; and the opticalsemiconductor device 1F according to the sixth embodiment is obtained.

According to the embodiment as described above, the opticalsemiconductor device 1F according to the sixth embodiment can bemanufactured; and as a result, effects similar to those of the sixthembodiment can be obtained. Because it is possible to manufacture manyoptical semiconductor devices 1F by performing the manufacturingprocesses once, mass production of the optical semiconductor device 1Fcan be realized; and as a result, the costs of the optical semiconductordevice 1F can be reduced.

Fourteenth Embodiment

A fourteenth embodiment of the invention will now be described withreference to FIGS. 20A to 20D. In the embodiment, a method formanufacturing the optical semiconductor device 1G according to theseventh embodiment will be described. Portions of the fourteenthembodiment similar to portions described in regard to the first tothirteenth embodiments are marked with like reference numerals, and adescription is omitted.

FIGS. 20A to 20D are cross-sectional views of processes, illustrating aportion of the method for manufacturing the optical semiconductor deviceof the embodiment.

The manufacturing processes according to the embodiment are similar tothe processes of the ninth embodiment from the film formation process ofthe light emitting layer 12 illustrated in FIG. 13A to the bondingprocess illustrated in FIG. 15B.

After the bonding process, as illustrated in FIG. 20A, a contact layer31 such as a Ni/Au layer is formed on the Cu electrode of the platinglayer 16 using electroless plating. In the electroless plating of the Niand the electroless plating of the Au, plating is performed similarly tothe formation process of the Ni/Au layer 21 according to the sixthembodiment.

Then, as illustrated in FIG. 20B, a solder paste 32 of Sn-3.0Ag-0.5Cu iscoated onto the contact layer 31 using printing. The coating method ofthe solder paste 32 is not limited to printing.

Subsequently, as illustrated in FIG. 20C, a solder bump 33 is formed onthe Cu electrode of the plating layer 16 by remelting the solder bypassing the transparent base member 18 of the wafer through a reflowoven and cleaning the flux residue. Thereby, the metal layers 11 a and11 b of the optical semiconductor device 1B are formed.

Finally, as illustrated in FIG. 20D, the multiple optical semiconductordevices 1G are cut out by dicing using a dicer; and the opticalsemiconductor device 1G according to the seventh embodiment is obtained.

According to the embodiment as described above, the opticalsemiconductor device 1G according to the seventh embodiment can bemanufactured; and as a result, effects similar to those of the seventhembodiment can be obtained. Because it is possible to manufacture manyoptical semiconductor devices 1G by performing the manufacturingprocesses once, mass production of the optical semiconductor device 1Gcan be realized; and as a result, the costs of the optical semiconductordevice 1G can be reduced.

Other Embodiments

The invention is not limited to the embodiments described above; andvarious modifications are possible without departing from the spirit ofthe invention. For example, several components may be deleted from allof the components illustrated in the embodiments described above.Further, components of different embodiments may be combined asappropriate. Although various numbers are illustrated in the embodimentsdescribed above, such numbers are examples and are not limited thereto.

While certain embodiments have been described, these embodiments havebeen presented by way of example only, and are not intended to limit thescope of the inventions. Indeed, the novel embodiments described hereinmay be embodied in a variety of other forms; furthermore, variousomissions, substitutions and changes in the form of the embodimentsdescribed herein may be made without departing from the spirit of theinventions. The accompanying claims and their equivalents are intendedto cover such forms or modifications as would fall within the scope andspirit of the invention.

1-20. (canceled)
 21. An optical semiconductor device, comprising: alight emitting layer having a first major surface and a second majorsurface opposite to the first major surface; a first electrode providedon the second major surface; a second electrode provided on the secondmajor surface; a transparent layer provided on the first major surface,the transparent layer being transparent, and the transparent layerlaterally extending beyond the light emitting layer; a fluorescent layerprovided on the transparent layer and containing phosphor, a first metalpost provided on the first electrode; a second metal post provided onthe second electrode; and a sealing layer provided on the second majorsurface, the sealing layer being formed of a material that islight-shielding with respect to a light emitted from the light emittinglayer, the sealing layer sealing the first metal post and the secondmetal post, and the sealing layer covering a side surface of the lightemitting layer, a side surface of the transparent layer having a portionthat is not covered with the fluorescent layer and the sealing layer, apart of the light emitted from the light emitting layer propagatingthrough the transparent layer and entering the fluorescent layer, andanother part of the light emitted from the light emitting layerpropagating through the transparent layer and emitted outside from theside surface of the transparent layer.
 22. The device according to claim21, wherein the light emitting layer includes a first semiconductorlayer, a second semiconductor layer, and an active layer providedbetween the first semiconductor layer and the second semiconductorlayer.
 23. The device according to claim 21, wherein the transparentlayer is made of a material having a refractive index between 1 and 2.24. The device according to claim 21, wherein the transparent layer ismade of an inorganic material.
 25. The device according to claim 24,wherein the inorganic material is glass.
 26. The device according toclaim 21, wherein the light emitting layer includes a semiconductorstacked body which was epitaxially grown on a substrate which wasremoved from the semiconductor stacked body after the growth.
 27. Anoptical semiconductor device, comprising: a light emitting layer havinga first major surface and a second major surface opposite to the firstmajor surface; a first electrode provided on the second major surface; asecond electrode provided on the second major surface; a transparentlayer provided on the first major surface, the transparent layer beingtransparent, and a side surface of the transparent layer protrudingbeyond a side surface of the light emitting layer; a fluorescent layerprovided on the transparent layer and containing phosphor, a first metalpost provided on the first electrode; a second metal post provided onthe second electrode; and a sealing layer provided on the second majorsurface, the sealing layer being formed of a material that islight-shielding with respect to a light emitted from the light emittinglayer, the sealing layer sealing the first metal post and the secondmetal post, and the sealing layer covering the side surface of the lightemitting layer, the side surface of the transparent layer having aportion that is not covered with the fluorescent layer and the sealinglayer, a part of the light emitted from the light emitting layerpropagating through the transparent layer and entering the fluorescent,and another part of the light emitted from the light emitting layerpropagating through the transparent layer and emitted outside from theside surface of the transparent layer.
 28. The device according to claim27, wherein the light emitting layer includes a first semiconductorlayer, a second semiconductor layer, and an active layer providedbetween the first semiconductor layer and the second semiconductorlayer.
 29. The device according to claim 27, wherein the transparentlayer is made of a material having a refractive index between 1 and 2.30. The device according to claim 27, wherein the transparent layer ismade of an inorganic material.
 31. The device according to claim 30,wherein the inorganic material is glass.
 32. The device according toclaim 27, wherein the light emitting layer includes a semiconductorstacked body which was epitaxially grown on a substrate which wasremoved from the semiconductor stacked body after the growth.
 33. Amethod for manufacturing an optical semiconductor device, comprising:removing a growth substrate from a light emitting layer while the lightemitting layer is supported by a support member including a sealinglayer, first metal posts and second metal posts, in a state that asupport substrate is not stuck on the sealing layer of a light emittingmember, the light emitting layer including a semiconductor stacked bodyepitaxially grown on the growth substrate, the light emitting memberincluding the light emitting layer, a plurality of sets of a positiveelectrode and a negative electrode provided on a second major surface ofthe light emitting layer, the first metal posts provided on each of thepositive electrodes, the second metal posts provided on each of thenegative electrodes, and the sealing layer, an electric current to causean emission of light from the light emitting layer is flown via thepositive and negative electrodes, the second major surface beingopposite to the substrate, forming a transparent layer on a first majorsurface side of the light emitting layer opposite to the second majorsurface after removing the growth substrate, the transparent layer beingmade of a material having a transparency; forming a fluorescent layer onthe transparent layer, the fluorescent layer including a phosphorabsorbing the light emitted from the light emitting layer and emitting alight having a wavelength which is different from a wavelength of thelight emitted from the light emitting layer, and performing singulationfor each of the sets of the positive electrode and the negativeelectrode.
 34. The method according to claim 33, wherein the forming ofthe transparent layer includes coating liquid glass on the first majorsurface and curing the liquid glass.
 35. The method according to claim33, wherein the light emitting layer is singulated for the each of thesets of the positive electrode and the negative electrode while thelight emitting layer is supported by a support member, and afterperforming the singulation, the transparent layer laterally extendsbeyond the light emitting layer.
 36. The method according to claim 33,wherein the light emitting layer is singulated for the each of the setsof the positive electrode and the negative electrode while the lightemitting layer is supported by a support member, and after performingthe singulation, a side surface of the transparent layer protrudesbeyond a side surface of the light emitting layer.
 37. The methodaccording to claim 33, wherein after performing the singulation, thesealing layer covers a side surface of the light emitting layer.